X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2009-12-22
2011-12-27
Song, Hoon (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S085000
Reexamination Certificate
active
08085900
ABSTRACT:
A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (−, +) and (+, −) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.
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Birch & Stewart Kolasch & Birch, LLP
Rigaku Corporation
Sanei Mona M
Song Hoon
LandOfFree
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