X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-05-22
2007-05-22
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S084000, C378S089000
Reexamination Certificate
active
11083775
ABSTRACT:
An X-ray reflectance is measured with the use of an X-ray detector, which is not less than 107cps in upper-limit counting rate and is not more than twenty cps in noise level, under the condition that a measuring time length per interval of scattering angle 2θ is not more than fifty milliseconds, so that the measurement of one reflectance curve is completed in a short time as several seconds. In another aspect of the invention, the X-ray detector used is not less than 107cps in upper-limit counting rate and is not more than 0.01 cps in noise level, and the measuring time length per interval is not less than a hundred seconds, so that the X-ray reflectance curve is obtained with not less than a nine-digit dynamic range. The X-ray detector may be an avalanche photo diode.
REFERENCES:
patent: 10-38821 (1998-02-01), None
patent: 11-237349 (1999-08-01), None
patent: 2004-37360 (2004-02-01), None
S. Kishimoto, et al., “A fast detector using stacked avalanche photodiodes for x-ray diffraction experiments with synchrotron radiation” Review of Scientific Instruments, vol. 69, No. 2, Feb. 1998, pp. 384-391, XP002333237.
Y. Hayasaki et al., “Measurement of resonant x-ray magnetic scattering from induced Cu polarizations in exchange-coupled Co/Cu multilayers.” Journal of Physics: Condensed Matter, vol. 16, Mar. 12, 2004, pp. 1915-1925, XP002333238.
Frishauf Holtz Goodman & Chick P.C.
Glick Edward J.
Rigaku Corporation
Yun Jurie
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