Method for washing and drying substrates

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...

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134 3, 134 26, 134 28, 134 30, 134 33, 134 41, 134 952, 134 953, 1341021, 134153, 134902, B08B 502

Patent

active

059976535

ABSTRACT:
A method for washing and drying a substrate includes the steps of (a) disposing a substrate on a spin chuck such that a surface to be treated faces upward, (b) applying a washing solution from a first nozzle to the surface of the substrate while rotating the substrate disposed on the spin chuck so as to cleanse the surface, and (c) blowing a gas from a second nozzle against the surface while rotating the substrate and moving the second nozzle above the substrate in a radial direction from a central portion toward a peripheral portion of the substrate, thereby drying the surface of the substrate.

REFERENCES:
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4871417 (1989-10-01), Nishizawa et al.
patent: 5248380 (1993-09-01), Tanaka
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5372652 (1994-12-01), Srikrishnan et al.
patent: 5456758 (1995-10-01), Menon
patent: 5558110 (1996-09-01), Williford, Jr.

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