Method for vacuum deposit on a curved substrate

Details Method for vacuum deposit on a curved substrate Method for vacuum deposit on a curved substrate

2006-10-17

2006-10-17

Meeks, Timothy (Department: 1762)

Coating processes

Nonuniform coating

Mask or stencil utilized

C427S248100, C427S164000, C427S162000, C427S166000, C427S165000, C427S167000

Reexamination Certificate

active

07122223

ABSTRACT:
The invention concerns a method which consists in a process known per se in producing, on the curved substrate (10) to be treated, a film of material derived from a specific material source (13). The invention is characterized in that it consists in inserting, between the curved substrate (10) and the material source (13), a mask (19) relative to the curved substrate (10), preferably selecting as mask (19), a mask comprising a ring-shaped part (20). The invention is particularly useful for providing lenses with antiglare treatment.

REFERENCES:
patent: 3627569 (1971-12-01), Beecham
patent: 4222345 (1980-09-01), Bergfelt et al.
patent: 4257692 (1981-03-01), Le Naour-Sene
patent: 5225057 (1993-07-01), LeFebvre et al.
patent: 5254236 (1993-10-01), Kinokiri et al.
patent: 5389397 (1995-02-01), Brennesholtz
patent: 5393398 (1995-02-01), Sugano
patent: 5513038 (1996-04-01), Abe
patent: 5724189 (1998-03-01), Ferrante
patent: 5993904 (1999-11-01), Boucher
patent: 38 16 578 (1989-03-01), None
patent: 1 380 432 (1965-03-01), None
patent: 60-218470 (1985-11-01), None
patent: 62-239103 (1988-04-01), None
patent: 03-31473 (1991-02-01), None
patent: 03-264668 (1991-11-01), None
patent: 06-192835 (1994-07-01), None

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