Method for using phase-shifting mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S394000

Reexamination Certificate

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06902851

ABSTRACT:
A phase-shifting mask for a photolithographic process includes a transparent material having first and second trenches. The first trench has a first depth and the second trench has a second depth deeper than the first depth. The phase-shifting mask is suitable for testing the effect of lights of two wavelengths on a layer of photoresist.

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