Method for tuning an attenuating phase shift mask

Details Method for tuning an attenuating phase shift mask Method for tuning an attenuating phase shift mask

1999-01-04

2000-02-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060278374

ABSTRACT:
The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160.degree. of phase shift. The method comprising the utilization of a phase measurement and selective etching operations which reduces the challenge of making an exacting 180.degree. phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.

REFERENCES:
patent: 5700605 (1997-12-01), Ito et al.

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