Method for treating substrate, method for conveying...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Reexamination Certificate

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07973907

ABSTRACT:
A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.

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patent: 2002-261001 (2002-09-01), None
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patent: 2005-268385 (2005-09-01), None
patent: 2006-032957 (2006-02-01), None
patent: 2006-32957 (2006-02-01), None
English Translation of JP 2005-268358 (dated Sep. 29, 2005).

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