Method for treating ozone layer depleting substances

Details Method for treating ozone layer depleting substances Method for treating ozone layer depleting substances

1993-12-08

1995-08-08

Mayekar, Kishor

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

588210, 588212, 588227, H05F 300

Patent

active

054395682

ABSTRACT:
A method for treating ozone layer depleting substances, in which a gaseous composition comprising helium or argon or a mixture thereof, or a gaseous mixture of argon and acetone, is introduced into a plasma reactor having a dielectric-coated electrode comprising a solid dielectric disposed on the surface of at least one of opposing electrodes, an atmospheric pressure glow discharge is generated in the gaseous atmosphere, gaseous ozone layer depleting substances are introduced into the glow discharge to decompose the substances, and resulting decomposition products are absorbed in water.

REFERENCES:
patent: 5026464 (1991-06-01), Mizuno et al.
CA 116:90262 (1991).
CA 118:66184 (1992)--same as JP 04-279,179 listed above.
Patent Abstracts of Japan, vol. 017, No. 079 (C-1027) 17 Feb. 1993 & JP-A-42 079 179 (Touwa Kagaku) 5 Oct. 1992.
Chemical Abstracts, vol. 118, No. 12, 1992, Columbus, Ohio, US; abstract No. 108961h, Sekiguchi `Thermal plasma decomposition of chlorofluorocarbons` abstract, & Koon Gakkaishi, vol. 18, No. 5, 1992.

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