Method for treating mixtures containing photopolymeric resin and

Radiation imagery chemistry: process – composition – or product th – Regenerating image processing composition – Developer

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430319, 430325, 430326, 430329, 210723, 210726, G03C 524

Patent

active

047600144

ABSTRACT:
A process for treating an aqueous alkaline spent mixture produced during preparation of circuit boards and comprising a photopolymer resin. According to the method, first, an acid, a polyvalent cation and a coagulation aid are mixed with the spent mixture to produce a heterogeneous treated mixture comprising coagulated, precipitated photopolymer resin and an aqueous phase. Then, the coagulated, precipitated photopolymer resin is separated from the aqueous phase to produce a non-tacky, non-gumlike photopolymer resin sludge.

REFERENCES:
patent: 4559295 (1985-12-01), Tomisawa et al.
Thompson et al, Introduction to Microlithography, American Chemical Society, Washington, D.C. 1983, pp. 111-116.

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