Method for treating etchant

Details Method for treating etchant Method for treating etchant

1992-10-14

1995-02-28

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204107, 204112, 204113, 204151, C25C 112

Patent

active

053933877

ABSTRACT:
In order to ensure an easy operation, a decreased cost in maintenance and installation, and a safe and effective use of chlorine gas generated in a closed system, a new method for treating an etchant is offered. The method comprises the following steps of; 1 treating an etchant including copper (I) chloride or ferric chloride containing copper by means of an electrolysis using a diaphragm to withdraw copper electrolytically deposited in a cathode cell, 2 supplying chlorine gas generated in an anode cell into another etchant used in an etching process, thereby enabling the etchant to be regenerated.

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