Method for treating a waste gas and an apparatus thereof

Details Method for treating a waste gas and an apparatus thereof Method for treating a waste gas and an apparatus thereof

1998-05-04

2000-04-18

Dunn, Tom

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

431 5, 423337, 55345, B01D 4512, B01D 5338

Patent

active

060511974

ABSTRACT:
Disclosed is a method for treating a waste gas and an apparatus thereof capable of reducing the space for establishing the apparatus for treating the waste gas and collecting minute particles formed by oxidizing and cooling the toxic waste gas flown into the apparatus for treating the waste gas through a collecting process without filtering the particles. When treating the waste gas generated in the semiconductor manufacturing process, it is not required to treat a byproduct as in the wet-type treating method and the polymers are collected effectively by means of cyclones separators having different diameters. As a result, as the filtering apparatus is not required excluding the cyclone separators, the cost for establishing the facilities can be reduced.

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