Method for treating a substrate surface

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

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427261, 427331, 427404, 4274071, 427496, 427497, 427500, 427509, 427510, 427514, 427525, 427526, 427535, 427550, 427569, B05D 306

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059391502

ABSTRACT:
The present invention relates to a method for treating a substrate surface. The substrate surface is coated with a thin film of a treating agent, which is capable of enhancing or reducing its affinity towards a metal precursor by exposure to an arbitrary kind of radiation beam. In a subsequent metal deposition step utilizing the metal precursor, the metal is selectively deposited on the exposed or unexposed areas, depending on the kind of treating agent. (FIG. 1)

REFERENCES:
Materials Research Society Symposium Proceedings, vol. 380, Apr. 19, 1995, p. 23-34, XP000600865 E.A. Dobsiz et al: "Self-Assembled Monolayer Films for Nanofabrication" * p. 26, paragraph 3--p. 30 *.
Journal of the Electrochemical Society, vol. 139, No. 6, Jun. 1, 1992, pp. 1677-1680, XP000324420 Calvert J.M. et al.: "Deep Ultraviolet Lithography of Monolayer Films With Selective Electroless Metallization" * p. 1677, paragraph 5--p. 1678 *.
Langmuir, vol. 11, No. 6, Jun. 1 1995, pp. 1841-1845, XP000571890 Potochnik S.J. et al.: "Selective Copper Chemical Vapor Deposition Using PD-Activated Organosilane Films" *p. 1841-p. 1842 *.
Patent Abstracts of Japan, vol. 011, No. 024 (C-399), Jan. 23, 1987 & 1987 & JP-A-61 190071 (Hitachi Chem Co Ltd), Sep. 3, 1986 * abstract *.
Journal of the American Chemical Society, vol. 115, No. 26, Dec. 29, 1993, pp. 12631/12632 XP000571415 Linford M.R. et al.: "Alkyl Monolayers Covalently Bonded To Silicon Surfaces".

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