Method for transforming a liquid flow into a gas flow and a devi

Details Method for transforming a liquid flow into a gas flow and a devi Method for transforming a liquid flow into a gas flow and a devi

1994-10-03

1995-07-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

261 62, 261152, 261156, C23C 1600

Patent

active

054317363

ABSTRACT:
Method and device which is to be used for the implementation thereof for transforming a liquid flow into a gas flow, whereby the liquid flow is led into a space in which the liquid evaporates and the vapour which thus arises is carried off mixed with a carrier gas. By ensuring that the carrier gas flow is passed directly past the liquid inlet port, whereby a complete mixing of both is achieved, and by keeping the way to the evaporation space short, a stabile and continuous gas flow is obtained. The provisions for mixing and evaporation are integrated in the device.

REFERENCES:
patent: 921934 (1909-05-01), Willard
patent: 1122703 (1914-12-01), Dull
patent: 1202771 (1916-10-01), Babbitt
patent: 1207664 (1916-12-01), Thurston
patent: 1798065 (1931-03-01), Clark
patent: 1965144 (1934-07-01), Kane
patent: 3759444 (1973-09-01), Tanaka
patent: 4916077 (1990-04-01), Forster
patent: 4950456 (1990-08-01), Forster
patent: 5204314 (1993-04-01), Kirlin
Webster's New Collegiate Dictionary, G & C Merriam Co., Springfield, Mass., .COPYRGT.1973, p. 786.

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