Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2011-03-01
2011-03-01
Young, Christopher G (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S296000, C430S942000, C250S492200, C250S492220, C250S492230
Reexamination Certificate
active
07897308
ABSTRACT:
A method for transferring a predetermined pattern onto a flat support performed by direct writing by means of a particle beam comprises at least: deposition of a photoresist layer on a free surface of the support, application of the beam on exposed areas of the photoresist layer, performing correction by modulation of exposure doses received by each exposed area, developing of the photoresist layer so as to form said pattern. Correction further comprises determination of a substitution pattern (11) comprising at least one subresolution feature and use of the substitution pattern (11) for determining the areas to be exposed when the electron beam is applied. In addition, modulation takes account of the density of the substitution pattern (11) near to each exposed area.
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Satoh et al., “Performance Improvement in e-beam Reticle Writer HL-800M,”Proceedings of SPIE, vol. 3096, Aug. 2007, pp. 72-83.
Pain et al., “65 nm Device Manufacture Using Shaped E-Beam Lithography,”Japanese Journal of Applied Physics, vol. 43, No. 6B, Jun. 29, 2004, pp. 3755-3761.
Bervin Georges
Manakli Serdar
Pain Laurent
Commissariat a l''Energie Atomique
Freescale Semiconductor Inc.
Oliff & Berridg,e PLC
Young Christopher G
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