Method for transferring a pattern

Details Method for transferring a pattern Method for transferring a pattern

2006-08-01

2006-08-01

Le, Thao P. (Department: 2818)

Printing

Processes

C438S690000, C101S485000

Reexamination Certificate

active

07082876

ABSTRACT:
A method and a device for forming at least a first pattern on a substrate (6,28), which is coated with a layer (5) on at least a first planar surface, are described. According to the method, a first pressing means (27) is arranged with a first structure (32) that defines the pattern, and the substrate (28) is arranged so that the first pressing means (27) is separated from the substrate (28) and so that the first pressing means (27) and the substrate (28) are unable to move transversely of the common center line (50) but are able to move freely in a direction along the center line (50). Subsequently, the first pressing means (27) is contacted with the substrate (28) while maintaining the common center line, and a pressure is applied to the substrate (28) and the first pressing means (27) to form said at least one pattern in the layer (30)

REFERENCES:
patent: 5669303 (1997-09-01), Maracas et al.
patent: 6109175 (2000-08-01), Kinoshita
patent: 6316163 (2001-11-01), Magoshi et al.
patent: 6655286 (2003-12-01), Rogers
patent: 6966997 (2005-11-01), Inganas et al.
patent: WO 01/33300 (2001-05-01), None
patent: WO 01/42858 (2001-06-01), None
patent: WO 01/69317 (2001-09-01), None

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