Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Reexamination Certificate
2006-11-14
2006-11-14
Goudreau, George A. (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Using film of etchant between a stationary surface and a...
C216S089000, C438S692000, C438S693000, C451S057000
Reexamination Certificate
active
07135124
ABSTRACT:
In accordance with the foregoing objects and advantages, the present invention provides a fabrication device that may be used during the grinding operation of the fabrication process. The fabrication device comprises a socket plate that includes a plurality of cavities formed therein that correspond in position and number to the solder (or other conductive material) bumps formed on the front surface of a product wafer.
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patent: 6120360 (2000-09-01), Ball et al.
patent: 6416616 (2002-07-01), Walker
patent: 6638389 (2003-10-01), Kassir et al.
patent: 6702652 (2004-03-01), Arai
patent: 01-222450 (1989-09-01), None
patent: 02-239621 (1990-09-01), None
patent: 2002-319558 (2002-10-01), None
Krywanczyk Timothy C.
Sprogis Edmund J.
Bond Schoeneck & King , PLLC
Goudreau George A.
McGuire George R.
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