Method for the wet treatment of disk-like objects

Details Method for the wet treatment of disk-like objects Method for the wet treatment of disk-like objects

2007-10-09

2007-10-09

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Nongaseous phase etching of substrate

Projecting etchant against a moving substrate or controlling...

C216S088000

Reexamination Certificate

active

10506473

ABSTRACT:
The invention relates to a method for the treatment of disk-like objects with one first liquid and at least one second liquid at least in a defined edge region of a disk-like object.

REFERENCES:
patent: 5896877 (1999-04-01), Willibald
patent: 0 316 296 (1989-05-01), None
patent: 1 052 682 (2000-11-01), None
patent: 1 202 326 (2002-05-01), None
Lysaght PS et al.:, “Clean solutions to the incoming wafer quality impact on lithography process yield limits in a dynamic copper/ low-k research and development environment”, Proceedings of the SPIE—The International Society for Optical Engineering, vol. 3998, 2000, pp. 284-293, XP008018107 the whole document.

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