Method for the treatment of semiconductor material

Details Method for the treatment of semiconductor material Method for the treatment of semiconductor material

1997-04-25

1998-10-13

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 3, 134 16, 134 251, 134 34, 134902, B08B 702

Patent

active

058206884

ABSTRACT:
A method for the treatment of semiconductor material in a liquid bath has the treatment based upon the occurrence of cavitation being brought about in the liquid bath. The semiconductor material is contacted with a cavitating liquid in order to clean fragments of the semiconductor material and to round fracture edges of the fragments.

REFERENCES:
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patent: 5217163 (1993-06-01), Henshaw
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patent: 5368054 (1994-11-01), Koretsky et al.
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patent: 5656097 (1997-08-01), Olesen et al.
patent: 5660335 (1997-08-01), Koppl et al.
patent: 5681396 (1997-10-01), Madanshetty
Handbook of Semiconductor Wafer Cleaning Technology, ed. W. Kern, Noyes Publications, pp. 405-409, 1993.

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