Method for the simultaneous formation of via-holes and wraparoun

Fishing – trapping – and vermin destroying

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437226, 437245, 437974, 148DIG28, 148DIG135, 156643, 156656, H01L 2102

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active

049786393

ABSTRACT:
Metallized via-holes and a wraparound metal plating are simultaneously formed on semiconductor chips by patterning a photoresist mask on the front surface of the wafer to open windows over metal pads as well as the grid areas where wraparound plating is desired; etching off the exposed metal if necessary and forming via-holes and grooves in the wafer by reactive ion etching to a depth which is less than the total thickness of the wafer; depositing a thin conductive film along the walls of the grooves and via-holes by electroless methods; plating the walls of the grooves and the via-holes with conductive metal by electrolytic methods; removing the back surface of the wafer ("backlapping") along with the floors of both the grooves and the via-holes, to expose the metal on the wall of the via-holes and separate the individual chips; and, depositing conductive metal on the back surface of the individual chips to complete the grounding path.

REFERENCES:
patent: 3323198 (1967-06-01), Shortes
patent: 3484341 (1969-12-01), Devitt
patent: 3562009 (1971-02-01), Cranston et al.
patent: 4089992 (1978-05-01), Doo et al.
patent: 4153988 (1979-05-01), Doo
patent: 4211603 (1980-07-01), Reed
patent: 4348253 (1982-09-01), Subbarao et al.
patent: 4403241 (1983-09-01), Butherus et al.
patent: 4426767 (1984-01-01), Swanson et al.
patent: 4467521 (1984-08-01), Spooner et al.
patent: 4512829 (1985-04-01), Ohta et al.
Tenedorio, Jaime G., "The Materials Properties and Microwave Performance of the Gallium Arsenide Power MESFET", May 1982, Ch. 6.

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