Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1983-12-14
1984-12-25
Rutledge, L. Dewayne
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423342, 423240, 423481, 423644, C01B 3312
Patent
active
044903430
ABSTRACT:
A method for separating chlorosilanes from a gaseous mixture which additionally contains hydrogen and hydrogen chloride by washing the gaseous mixture with saturated hydrochloric acid is disclosed. The resulting chlorosilane hydrolysis products can remain in the hydrochloric acid serving as washing liquid, without interfering with the purifying action. The suspended hydrolysis products are easily filtrable, and can be periodically separated from the hydrochloric acid. In a preferred embodiment, the hydrochloric acid is recirculated and injected into the gas stream being washed.
REFERENCES:
patent: 4252780 (1981-02-01), Koppl
Curatolo Luigi
Glembin Dirk
Kappler Fritz-Robert
Trapani Vittorio
Brody Christopher W.
Dynamit Nobel AG
Rutledge L. Dewayne
LandOfFree
Method for the separation of chlorosilanes from a gaseous mixtur does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the separation of chlorosilanes from a gaseous mixtur, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the separation of chlorosilanes from a gaseous mixtur will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1152240