Method for the selective deposition of bismuth based ferroelectr

Details Method for the selective deposition of bismuth based ferroelectr Method for the selective deposition of bismuth based ferroelectr

1997-12-23

2000-09-19

King, Roy V.

Coating processes

Nonuniform coating

Applying superposed diverse coatings or coating a coated base

427287, 427256, 427 81, 4272557, 427309, 4272481, B05D 500, C23C 1600

Patent

active

061208469

ABSTRACT:
A method is described for the selective deposition of bismuth based ferroelectric films by selective chemical vapor deposition on a substrate. Selectivity in the deposition process is attained by selection of substrate-precursor combinations which assure high bismuth deposition efficiency in certain areas and low bismuth deposition efficiency in other areas in combination with specific process parameters.

REFERENCES:
patent: 5217756 (1993-06-01), Shinzawa
patent: 5387438 (1995-02-01), Werner et al.
patent: 5478610 (1995-12-01), Desu et al.
patent: 5589425 (1996-12-01), Hoshino et al.

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