Method for the repair of lithographic masks

Details Method for the repair of lithographic masks Method for the repair of lithographic masks

1994-11-18

1997-11-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430324, 427558, 156635, 156646, G03F 900

Patent

active

056862067

ABSTRACT:
The present invention relates to a method for the repair of void type defects in phase-shifting optical lithography masks by depositing a transparent mateial on the defect from a gaseous precursor by ultraviolet beam-induced deposition.

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