Method for the repair of defects in lithographic masks

Details Method for the repair of defects in lithographic masks Method for the repair of defects in lithographic masks

1993-12-16

2000-12-12

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061596418

ABSTRACT:
The present invention relates to a method for the repair of defects in the nonprinting region of a phase-shifting optical lithography mask by depositing an opaque material on the defect from a gaseous precursor by beam-induced deposition.

REFERENCES:
patent: 4164788 (1979-08-01), Jain
patent: 4451503 (1984-05-01), Blum et al.
patent: 4489102 (1984-12-01), Olmer et al.
patent: 4543270 (1985-09-01), Oprysko et al.
patent: 4609566 (1986-09-01), Hongo et al.
patent: 4668528 (1987-05-01), Ehrlich et al.
patent: 4698236 (1987-10-01), Kellogg et al.
patent: 4711790 (1987-12-01), Morishige
patent: 4727234 (1988-02-01), Oprysko et al.
patent: 4778693 (1988-10-01), Drozdowicz et al.
patent: 4901668 (1990-02-01), Murakami
patent: 4902899 (1990-02-01), Lin et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5085957 (1992-02-01), Hosono
patent: 5091979 (1992-02-01), White
patent: 5273849 (1993-12-01), Harriott et al.
Baum et al., "Radiation-Induced Repair of Clear Defects in Masks", Research Disclosure, Feb. 1987, No. 274, Kenneth Mason Publications Ltd, England.
Toh, et al., "Chromeless Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", A Preprint from the Tenth Annual Symposium on Microlithography of BACUS, Sep., 1990.
Watanabe et al., "Pattern Transfer Characteristics of Transparent Phase Shifting Mask", Japanese Journal of Applied Physics, vol. 30, No. 11B, Nov., 1991, pp. 3004-3009.
Levenson, "What IS a Phase-Shifting Mask", IBM Research Division, K32/802D, 605 Harry Road, San Jose, CA 95120.
Watanabe et al., "Transparent Phase Shifting Mask", Kyoto Research Laboratory, Matsushita Electronics Corporation 19, Nishikujo-Sasugach, Minami-ku, Kyoto 601 Japan. 1990 IEEE.
Baum et al, "Projection Printing of God Micropatterns by Photochemical Decomposition", Appl. Phys. Lett. 49 (18), Nov. 3, 1986.
"Fabrication of Grooved Glass Substrates by Phase Mask Lithography", Disclosed anonymously, Research Disclosure, Jan. 1991, No. 321, Kenneth Mason Publications Ltd, England.

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