Measuring and testing – Testing of material
Reexamination Certificate
2006-04-13
2008-08-26
Raevis, Robert R (Department: 2856)
Measuring and testing
Testing of material
C356S369000
Reexamination Certificate
active
07415902
ABSTRACT:
Methods for the quantification of hydrophilic properties of a porous material, as well as determining a depth of damage of a porous material are disclosed. An example method includes performing a first ellipsometric measurement on the porous material using a first adsorptive having a first wetting angle. The example method further includes performing a second ellipsometric measurement on the porous material using a second adsorptive having a second wetting angle, wherein the first and second wetting angles are different towards the porous material. The hydrophilic properties of the porous material are determined based, at least in part, on the first and second ellipsometric measurements.
REFERENCES:
patent: 6208014 (2001-03-01), Wu et al.
patent: 6435008 (2002-08-01), Baklanov et al.
patent: 2002/0022378 (2002-02-01), Baklanov et al.
Galindo et al., “Systematic positron study of hydrophilicity of the internal pore surface in ordered low-ksilica thin films”, Materials Science and Engineering B, Elsevier Sequoia, vol. 102, No. 1-3, pp. 403-408 (Sep. 15, 2003).
Revol et al., “Porosimetry Measurements on Low Dielectric Constant—Thin Layers by Coupling Spectroscopic Ellipsometry and Solvent Adsorption-Desorption”, Journal of Porous Materials, vol. 12, No. 2, pp. 113-121 (Apr. 2005).
Quoc Toan Le et al., “Removal of Plasma-Modified Low-kLayer Using Dilute HF: Influence of Concentration”, The Electrochemical Society, Inc., Electrochemical and Solid-State Letters 8 (7), pp. F21-F24 (2005).
Mannaert et al., “Minimizing plasma damage and in situ sealing of ultralow-kdielectric films by using oxygen free fluorocarbon plasmas”, American Vacuum Society, J.Vac. Sci. Technol. B 23(5), pp. 2198-2202 (Sep./Oct. 2005).
Extended European Search Report Application No. EP 05 01 5412, for Interuniversitaire Microelectronica Centrum vzw, dated Jan. 24, 2006.
Baklanov Mikhail
Le Quoc Toan
Mogilnikov Konstantin
Interuniversitair Microelektronica Centrum (IMEC vzw)
McDonnell Boehnen & Hulbert & Berghoff LLP
Raevis Robert R
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