Method for the production of semiconductor devices using electro

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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346158, 346161, 427249, 427250, 430296, 430298, 430315, B05D 306

Patent

active

042397880

ABSTRACT:
A process for forming a delineated vapor deposition film of a deposition material on a substrate. The delineation is accomplished by exposing selected areas of the substrate to an electron beam before depositing the deposition material whereby the sticking coefficients of the selected areas are sufficiently reduced so as to prevent any significant deposition in those areas. Furthermore, irradiated areas of the substrate can be restored to their original surface characteristics by exposure to a second electron beam while the substrate is at an elevated temperature. Thus, areas of the substrate can be negatively delineated to prevent deposition, and such negatively delineated surfaces can then be positively delineated to permit deposition.

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patent: 3462762 (1969-08-01), Kaspaul et al.
patent: 3485657 (1969-12-01), Beaudry
patent: 3660087 (1972-05-01), Kaspaul et al.
patent: 3809635 (1974-05-01), Gillot et al.
patent: 3944686 (1976-03-01), Froberg
patent: 4053350 (1977-10-01), Olsen et al.
patent: 4086108 (1978-04-01), Gonda

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