Method for the production of reflectors

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

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156 60, 156 89, 1563066, 1563096, 427191, 427431, 359838, 359900, B32B 3106, B32B 3112, B32B 3126, G02B 508

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055058051

ABSTRACT:
For the production of lightweight reflectors or mirror structures, metallic silicon of sufficient thickness is applied to a CFC or CMC substrate preform structure having the dimensions of the component to be produced by a heat treatment process, in particular at temperatures between 1300.degree. C. and 1600.degree. C. and in a vacuum or in a protective atmosphere. In this way, reflectors or mirror structures are formed directly. It is possible to work at temperatures of 300.degree.-600.degree. C. when the silicon is applied in the form of wafers which are joined to the substrate preform by way a zone of a melt eutectic incorporating a nonferrous metal. Preferably the nonferrous metal is gold.

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Naumann/Schroder: Bauelemente der Optik, 5th edition, p. 64, Hanser Verlag.
SiRA; ESTEC-Contract No. 5976/84/NL/PR; Oct. 1985.
W. Englisch, R. Takke, SPIE, vol. 1113, Reflective Optics II, 1989, pp. 190-194.

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