Radiant energy – Electrically neutral molecular or atomic beam devices and...
Patent
1996-04-26
1998-08-04
Nguyen, Kiet T.
Radiant energy
Electrically neutral molecular or atomic beam devices and...
H05H 300
Patent
active
057897441
ABSTRACT:
A technique to enhance the yield of atomic ion species (H.sup.+, D.sup.+, O.sup.+, N.sup.+, etc.) from plasma ion sources. The technique involves the addition of catalyzing agents to the ion discharge. Effective catalysts include H.sub.2 O, D.sub.2 O, O.sub.2, and SF.sub.6, among others, with the most effective being water (H.sub.2 O) and deuterated water (D.sub.2 O). This technique has been developed at Argonne National Laboratory, where microwave generated plasmas have produced ion beams comprised of close to 100% purity protons (H.sup.+) and close to 100% purity deuterons (D.sup.+). The technique also increases the total yield of protons and deuterons by converting unwanted ion species, namely, H.sub.2.sup.+,H.sub.3.sup.+ and D.sub.2.sup.+, D.sub.3.sup.+, into the desired ion species, H.sup.+ and D.sup.+, respectively.
REFERENCES:
patent: 3742219 (1973-06-01), Damm et al.
patent: 4584473 (1986-04-01), Hashimoto et al.
patent: 5654541 (1997-08-01), Outlaw et al.
Lykke Keith
Spence David
Dvorscak Mark P.
Moser William R.
Nguyen Kiet T.
Soltis Lisa M.
The United States of America as represented by the United States
LandOfFree
Method for the production of atomic ion species from plasma ion does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the production of atomic ion species from plasma ion , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the production of atomic ion species from plasma ion will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1179694