Method for the production of anti-reflection coatings on optical

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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350164, 350165, 427 10, 427 42, 427164, 427166, 427167, 427248B, 427248I, 427419A, 427419B, G02B 110, B05D 306, B05D 506

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039845818

ABSTRACT:
A method for the production, without thermal treatment, of an anti-reflection coating on surfaces of optical elements of transparent, thermally sensitive material such as organic polymeric plastic material which comprises coating the surface with a layer of silicon oxide by vaporizing said silicon oxide by applying the energy of an electron beam thereto under vacuum in such manner that the vaporized molecules are ionized by said beam and are deposited on said elements in ionized condition. A multi-layer coating may then be applied by depositing with an increasing rate on said coating a layer of a substance of higher refractive index than that of said plastic material while continuing the deposition of the silicon oxide, and then depositing thereon a final layer of anti-reflection material such as silicon oxide. The substance of higher refractive index may an oxide of cerium, tantalum, titanium or zirconium.

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patent: 2553289 (1951-05-01), Alexander
patent: 2641954 (1953-06-01), Schorf
patent: 3271179 (1966-09-01), Smith
patent: 3356522 (1967-12-01), Libbert
patent: 3373278 (1968-03-01), Cilyo
patent: 3706485 (1972-12-01), Fawcett
patent: 3804491 (1974-04-01), Morokuma
Strong, Concepts of Classical Optics, pp. 251-252, W. H. Freeman & Co., San Francisco, 1958.
Kennedy et al., "Gas Scattering and Ion-Plating Deposition Methods", Research/Development, vol. 22, No. 11 (1971), pp. 40-44.

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