Method for the production of a thin film electric circuit

Details Method for the production of a thin film electric circuit Method for the production of a thin film electric circuit

1975-01-22

1976-12-14

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

156 7, 427 96, C25D 502

Patent

active

039974111

ABSTRACT:
Method for the production of an electric thin-film circuit having a conductor path and at least one capacitor and/or one resistor, and comprising a substrate base member and the forming of a first tantalum-aluminum-alloy layer thereupon and etching the tantalum-aluminum-alloy layer to form the outline of the conductor path. A second tantalum-aluminum alloy layer is then laid on the first tantalum-aluminum-alloy layer and has a tantalum content of approximately 2 through 20 atomic percent at least in the area of the capacitor. An oxidation layer is formed upon the second tantalum-aluminum-alloy layer to constitute the capacitor dielectric. The conductor paths and the opposite capacitor electrode are formed of a conductive layer such as a nickel-chromium-gold layer which is applied as a surface layer and serves as a capacitor electrode and as conductor paths.

REFERENCES:
patent: 3386011 (1968-05-01), Murray, Jr. et al.
patent: 3387952 (1968-06-01), La Chapelle
patent: 3607679 (1971-09-01), Melroy

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