Method for the production of a reflector

Details Method for the production of a reflector Method for the production of a reflector

1994-09-02

1996-10-15

Engel, James

Adhesive bonding and miscellaneous chemical manufacture

Methods

Surface bonding and/or assembly therefor

156 89, 156257, 156278, 359838, 359900, 427162, 427191, 427205, 427227, 427249, 427585, B32B 3112, B32B 3126

Patent

active

055650520

ABSTRACT:
In order to produce lightweight mirror structures or other reflecting components, preformed silicon elements of sufficient wall thickness are applied to a CFC or CMC substrate structure with the dimensions of the component to be produced, at a temperature in the range 1300.degree. C. and 1600.degree. C. either in vacuum or in a protective atmosphere. In this way a mirror structure or reflector is formed directly. It is possible to work at temperatures in the range of 300.degree. C. to 600.degree. C. when the silicon is applied in the form of a preform such as a wafer, which is joined to the substrate by way of a zone of a melt eutectic incorporating a nonferrous metal, which is preferably gold. The surfaces are subsequently coated.

REFERENCES:
patent: 4444467 (1984-04-01), Shuskus et al.
patent: 4465777 (1984-08-01), Shuford
patent: 4623228 (1986-11-01), Galasso et al.
patent: 4856887 (1989-08-01), Wakugawa et al.
patent: 5380475 (1995-01-01), Goedtke et al.
Naumann/Schroder: Bauelemente der Optik, 5th edition, p. 64, Hanser Verlag.
SiRA; ESTEC-Contract No. 5976/84/NL/PR; Oct. 1985.
W. Englisch, R. Takke, SPIE, vol. 113, Reflective Optics II, 1989, pp. 190-194.

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