Method for the preparation of relief structures

Details Method for the preparation of relief structures Method for the preparation of relief structures

1974-02-21

1976-05-18

Brammer, Jack P.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96115R, 260468J, 260 47CZ, G03C 168, G03C 500

Patent

active

039575128

ABSTRACT:
Novel cyclic monomers leaving two functional groups capable of undergoing condensation reactions to form amide, urea or urethane linkages and at least one photo or radiation-reactive group are condensed with cyclic comonomers to form a soluble, substantially-linear condensation pre-polymer. A solution of the prepolymer is applied to a substrate and the solution is evaporated off to form a film or foil. The photo or radiation-sensitive layer or foil is exposed or irradiated through a pattern, the unexposed or unirradiated part is dissolved or stripped off, and the relief structure which remains is annealed if necessary. The relief structures obtained are distinguished particularly by the sharpness of their edges, good mechanical and chemical properties as well as good insulating properties. They are suited particularly for the preparation of miniaturized insulating layers.

REFERENCES:
patent: 3475176 (1969-10-01), Rauner
patent: 3650746 (1972-03-01), Builey
patent: 3753720 (1973-08-01), Kloczewski et al.
patent: 3801638 (1974-04-01), Cerwonka
patent: 3847767 (1974-11-01), Kloczewski
patent: 3858510 (1975-01-01), Kai et al.

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