Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-03-20
1997-10-14
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7021
Patent
active
056771029
ABSTRACT:
Proposed is a method for the preparation of a photoresist composition in the form of a solution which is free from the troubles due to formation of particles in the solution after prolonged storage. The method comprises the steps of (a) preparing a solution by dissolving an alkali-soluble resin and a quinone diazide group-containing compound in an organic solvent; and (b) subjecting the solution to a heat treatment at 75.degree. to 85.degree. C. for such a length of time that the solution diluted with ethyleneglycol monomethyl ether in a solid concentration of 0.2% has an absorbance of light in the range from 0.05 to 0.75 at a wavelength of 500 nm for an optical path length of 1 cm.
REFERENCES:
patent: 5059507 (1991-10-01), Uetani et al.
patent: 5290658 (1994-03-01), Uenishi et al.
patent: 5429904 (1995-07-01), Nagase et al.
patent: 5436107 (1995-07-01), Tomioka et al.
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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