Method for the preparation of mask for X-ray lithography

Details Method for the preparation of mask for X-ray lithography Method for the preparation of mask for X-ray lithography

1989-12-08

1991-10-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430967, 378 35, G03F 900

Patent

active

050573888

ABSTRACT:
A method of obtaining a mask for X-ray lithography having a thin oxide film supported on an annular silicon base includes the following steps:

REFERENCES:
patent: 4634643 (1987-01-01), Suzuki

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