Method for the preparation of an organosiloxane oligomer and a n

Details Method for the preparation of an organosiloxane oligomer and a n Method for the preparation of an organosiloxane oligomer and a n

1986-09-09

1988-02-23

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

556451, 556453, 556454, 556455, 556456, C07F 708

Patent

active

047271728

ABSTRACT:
An efficient method is proposed for the preparation of an organosiloxane oligomer represented by the general formula YSi(R.sup.1).sub.n (--O--SiR.sub.3).sub.3-n, in which each of the groups denoted by R and R.sup.1 is a halogen-substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, Y is a hydrogen atom or a monovalent group selected from methyl, phenyl, vinyl, chloromethyl and 3-(meth)acryloxypropyl groups and n is zero, 1 or 2, by the reaction of an organosilicon halomagnesium salt of the formula R.sub.3 Si--O--MgX, in which X is a halogen atom, and an organosilane compound of the general formula YSi(R.sup.1).sub.n (Z).sub.3-n, in which Z is a halogen atom or a lower alkoxy group. In particular, tetrasiloxane compounds represented by the general formula Y.sup.1 Si[--O--Si(CH.sub.3).sub.2 (CH.sub.2 CH.sub.2 CF.sub.3)].sub.3, in which Y.sup.1 is a hydrogen atom, chloromethyl group or 3-methacryloxypropyl group, are each a novel compound not known in the prior art.

REFERENCES:
patent: 2961425 (1960-11-01), Pierce et al.
patent: 3006878 (1961-10-01), Talcott
patent: 3377371 (1968-04-01), Quaal

Affiliated with

Also associated with

Rating

Method for the preparation of an organosiloxane oligomer and a n does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the preparation of an organosiloxane oligomer and a n, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the preparation of an organosiloxane oligomer and a n will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-603712