Method for the preparation of a superlattice multilayered film

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

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117 92, 117105, 117108, 117109, 117928, C30B 2518

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active

055650309

ABSTRACT:
A novel method is proposed for the preparation of a superlattice multilayered film, which has a multilayered structure alternately consisting of epitaxially grown layers of a metal and layers of a metal oxide formed on the surface of a substrate and is useful as high-speed electronic devices, soft X-ray reflectors, neutron beam polarizers and the like. According to the discovery leading to this invention, good epitaxial growth of the layers can be accomplished when the metal has a face-centered cubic lattice structure and the metal oxide has a sodium chloride-type cubic lattice structure and the difference in the lattice constant between the metal and the metal oxide is small enough as in the combinations of silver and nickel oxide or magnesium oxide and nickel and nickel oxide.

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Navinsek et al., "Sputter deposition of Multilayered Structures for Use in Sputter Depth Profile Calibration," Vaccum, vol. 36, No. 10 pp. 711-714, 1986.
Yamada et al. "Fabrication of Metal/Metaloxide Multi-Layered Film with Periodic Structure,", Shinku (1993), 36(6) pp. 559-562 Translated abs. only.
Fuchs et al, "Ion Bean Mixing of Silver-Magnesium-Oxide Multilayers", thin Solid Films, vol. 165(1988), pp. 347-358.
Kado, "Epitaxial Superlattice of AglN:O" Prepared on MgO(oci) Journal of Crystal Growth vol. 144 (1994) PP. 329-334.

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