Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1985-07-10
1987-01-13
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430287, 430325, 430311, 522 65, 522148, 526279, G03C 152, G03C 171, G03C 516, C08F 3008
Patent
active
046364544
ABSTRACT:
The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formula
REFERENCES:
patent: 4301231 (1981-11-01), Atarashi et al.
Fujimoto Teruo
Kazama Takeo
Takamizawa Minoru
Yamamoto Akira
Hamilton Cynthia
Kittle John E.
Shin-Etsu Chemical Co. , Ltd.
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