Method for the preparation of a patterned photoresist layer and

Details Method for the preparation of a patterned photoresist layer and Method for the preparation of a patterned photoresist layer and

1985-07-10

1987-01-13

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430287, 430325, 430311, 522 65, 522148, 526279, G03C 152, G03C 171, G03C 516, C08F 3008

Patent

active

046364544

ABSTRACT:
The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formula

REFERENCES:
patent: 4301231 (1981-11-01), Atarashi et al.

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