Method for the preparation of a patterned photoresist layer and

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430287, 430325, 430311, 522 65, 522148, 526279, G03C 152, G03C 171, G03C 516, C08F 3008

Patent

active

046364544

ABSTRACT:
The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formula

REFERENCES:
patent: 4301231 (1981-11-01), Atarashi et al.

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