Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Patent
1996-09-26
1998-05-19
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
134108, 134 952, 34 77, 34470, 34 78, B08B 1502
Patent
active
057525323
ABSTRACT:
This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N.sub.2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.
REFERENCES:
patent: 4424633 (1984-01-01), Bernhardt et al.
patent: 4777970 (1988-10-01), Kushuhara
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4868996 (1989-09-01), Ohmori et al.
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5052126 (1991-10-01), Moe et al.
patent: 5054210 (1991-10-01), Schumacher et al.
patent: 5055138 (1991-10-01), Slinn
patent: 5069235 (1991-12-01), Vetter et al.
patent: 5158100 (1992-10-01), Tanaka et al.
patent: 5193560 (1993-03-01), Tanaka et al.
patent: 5226242 (1993-07-01), Schwenkler
patent: 5249371 (1993-10-01), Saito et al.
patent: 5265632 (1993-11-01), Nishi
patent: 5273589 (1993-12-01), Griswold et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5304253 (1994-04-01), Grant
patent: 5331987 (1994-07-01), Hayashi et al.
patent: 5492138 (1996-02-01), Taricco
patent: 5503681 (1996-04-01), Inada et al.
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5539995 (1996-07-01), Bran
Holland Joseph W.
Stinson Frankie L.
LandOfFree
Method for the precision cleaning and drying surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the precision cleaning and drying surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the precision cleaning and drying surfaces will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1845519