Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1980-03-10
1982-01-26
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
156643, C23C 1500, C23F 100
Patent
active
043127320
ABSTRACT:
The endpoints of plasma discharge processing operations (e.g., plasma stripping of photoresists and plasma etching) are determined by monitoring the light produced in the space surrounding the object being processed. The optical monitor includes a wavelength selective device which is adjusted to transmit light from a selected excited species, which includes particles from the surface being processed. The surface includes a layer of one material overlaying a second material. If the selected excited species includes particles of the first material, then the endpoint of the removal operation occurs when the monitored intensity falls below a predetermined threshold level. When the selected excited species includes particles of the second material, then the endpoint occurs when the monitored intensity rises above a preselected threshold level.
REFERENCES:
patent: 3664942 (1972-05-01), Havas et al.
J. E. Greene et al., "Glow-Discharge Optical Spectroscopy for the Analysis of Thin Films", J. Appl. Phys., vol. 44, pp. 2509-2513 (1973).
J. E. Greene et al., "Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness", J. Vac. Sci. Technol., vol. 10, pp. 1144-1149 (1973).
Degenkolb Eugene O.
Griffiths James E.
Mogab Cyril J.
Bell Telephone Laboratories Incorporated
Friedman Allen N.
Schneider Bruce S.
Weisstuch Aaron
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