Method for the optical alignment of designs in two near planes a

Details Method for the optical alignment of designs in two near planes a Method for the optical alignment of designs in two near planes a

1979-09-13

1982-01-19

Punter, William H.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

250237G, 356400, G01B 902, G01B 1100

Patent

active

043113893

ABSTRACT:
The invention relates to the alignment of designs in two near planes, whereby one (the mask) carries a design which is to be reproduced on the second (the pattern).
The invention relates to a method for the optical alignment of these two planes using a pair of marks formed by a lens (4) having linear Fresnel zones inscribed on the mask (1) and a reflecting grating (3) of appropriate width inscribed on the pattern (2). The illumination by a parallel beam of monochromatic light of the lens with Fresnel zones produces on the pattern a substantially rectangular illumination spot which, when made to coincide with the line inscribed on the pattern is reflected or transmitted, and supplies a detected intensity maximum or minimum depending on whether the lines reflects more or less than the remainder of the pattern. The invention also relates to an optical alignment apparatus for performing this method.
The invention applies to the alignment of lithographic X-ray masks or photographic masks with respect to patterns on which reproduction is to take place.

REFERENCES:
patent: 3690881 (1972-09-01), King
patent: 3768911 (1973-10-01), Erickson
patent: 3783520 (1974-01-01), King
patent: 3867038 (1975-02-01), Westell
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4113388 (1978-09-01), Gates et al.
patent: 4153367 (1979-05-01), Lietar et al.
King et al., "Photolithographic Mask Alignment Using Moire Techniques", Applied Optics, 11-1972, pp. 2455-2459.
Hermannsfeldt et al., "Precision Alignment Using a System of Large Rectangular Fresnel Lenses", Applied Optics, 6-1968, pp. 996-999.
Milaan, A. Van, "Eeen eenvoudige optische uitlijnmethode met een grote nauwkeurigheid", T.N.O-Niews, 4-1967, pp. 162-164.

Affiliated with

Also associated with

Rating

Method for the optical alignment of designs in two near planes a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the optical alignment of designs in two near planes a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the optical alignment of designs in two near planes a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1912826