Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1983-05-10
1984-04-17
Newsome, John H.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 82, 204177, 357 52, B05D 512
Patent
active
044434898
ABSTRACT:
A method for the chemical vapor deposition of amorphous, glass-like, phosphorous-nitrogen based films on the surface of a substrate is disclosed. The process entails exposing the substrate to a reactant gas stream comprising phosphorous, nitrogen and hydrogen. This method is particularly suited for passivating Group III-V semiconductor materials.
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Miller and Shaw, Phosphorus-Nitrogen Compounds Part III-Phosphams, Jrnl. of Chem. Soc., Jun., 1963, p. 3233.
Vebrek and Roos, Dielectric Properties of Phosphorus Nitride Films, Jrnl of Chem. Solids, 1976, vol. 37, p. 554.
Vebrek, Iqbal, Brunner and Scharli, Preparation and Properties of Amorphous Nitride Prepared in a Low-Pressure Plasma, Philosophical Magazine B, 1981, vol. 43, No. 3, 527-547.
Cowher Melvyn E.
Shuskus Alexander J.
Cohen Alan C.
Newsome John H.
United Technologies Corporation
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