Method for the formation of fluorine doped metal oxide films

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4272555, 427314, 4273722, C23C 1600

Patent

active

051241803

ABSTRACT:
The invention relates to a method of producing a substantially haze free, fluorine doped metal oxide coating on a substrate such as glass. The method includes the steps of heating a surface of the substrate to be coated, contacting the surface with a vapor including a metal oxide precursor, an oxidizing agent, and a dopant containing a chemically reactive vinylic fluorine atom, and thermally oxidizing the vapor into a fluorine containing metal oxide film.
Another feature of the invention is an apparatus for producing a uniform, substantially haze free, fluorine containing metal oxide thin film coating on a substrate such as glass. The apparatus includes a heater to heat the substrate to between approximately 450.degree. and 600.degree. C. and a conveyor to convey the heated substrated to a reaction zone adjacent an injector head. The injector head produces a vapor containing a metal oxide precursor, an oxidizing agent, and a dopant containing a chemically reactive vinylic fluorine atom. The vapor is oxidized into a fluorine containing metal oxide coating on the substrate.

REFERENCES:
patent: Re31708 (1984-10-01), Gordon
patent: 3306768 (1967-02-01), Peterson
patent: 3650815 (1972-03-01), Ghoshtagore et al.
patent: 3949146 (1976-04-01), Kane et al.
patent: 4146657 (1979-03-01), Gordon
patent: 4377613 (1983-03-01), Gordon
patent: 4500567 (1985-02-01), Kato et al.
patent: 4508054 (1985-04-01), Baumberger et al.
patent: 4529627 (1985-07-01), Zurbig
patent: 4590096 (1986-05-01), Lindner
patent: 4696837 (1987-09-01), Lindner
patent: 4751149 (1988-06-01), Vijayakumar et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for the formation of fluorine doped metal oxide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the formation of fluorine doped metal oxide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the formation of fluorine doped metal oxide films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-931911

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.