Method for the formation of an indium oxide film by electrodepos

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Forming nonmetal coating

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205122, 205316, 205158, 205159, 205162, 205164, 205167, 205188, 205190, 205320, 205323, 4271263, 4271261, 4271262, 427108, 427314, 427316, 427318, 4274192, 427435, 4274431, 4274432, C25D 900, C25D 904, C25D 910, B05D 118

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061103470

ABSTRACT:
A method for forming an indium oxide film on an electrically conductive substrate by immersing the substrate and a counter electrode in an aqueous solution containing at least nitrate and indium ions and flowing an electric current between the substrate and the couter electrode, thereby causing indium oxide film formation on the substrate, is provided. A substrate for a semiconductor element and a photovoltaic element produced using the film forming method are also provided. An aqueous solution for the formation of an indium oxide film by an electroless deposition process, containing at least nitrate and indium ions and tartrate, is also disclosed. A film-forming method for the formation of an indium oxide film on a substrate by an electroless deposition process, using the aqueous solution, and a substrate for a semiconductor element and a photovoltaic element produced using the film-forming method are further provided.

REFERENCES:
patent: 4369208 (1983-01-01), Okunaka et al.
Electroless Plating, Denki-Tokin Kenkyukai ed., Daily Industry Newspaper, p. 134 (1994).

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