Method for the fabrication of an alternation of layers of monocr

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437 90, 437915, 437 83, 148DIG164, H01L 2120

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049525263

ABSTRACT:
A method for making a layer of monocrystalline, semiconducting material on a layer of insulating material is disclosed. For this, epitaxial growth is achieved in a cavity closed by layers of dielectric materials, using seeds of monocrystalline, semiconducting material of a substrate. This method thus enables a 3D integration of semiconductor components.

REFERENCES:
patent: 4619033 (1986-10-01), Jastrzebski
patent: 4663831 (1987-05-01), Birrittella et al.
patent: 4725112 (1988-02-01), Bridges et al.
patent: 4758531 (1988-07-01), Beyer et al.
patent: 4760036 (1988-07-01), Schubert
patent: 4849371 (1989-07-01), Hansen et al.
"Mosfet Structure", T. H. Ning, V. J. Silvestri, and D. D. Tang, IBM Technical Disclosure Bulletin, vol. 25, No. 3A, Aug. 1982, pp. 1179-1182.
S. Wolf et al., Silicon Processing for the VLSI Era, Sunset Beach, Calif., Lattice Press, (1986), pp. 155-156.
Extended Abstracts of the 18th (1986 International) Conference on Solid State Devices and Materials, Tokyo, 1986, pp. 713-714, L. Karapiperis et al.: "Selective Epitaxial Growth of Si and In Situ Deposition of Amorphous-or Poly-Si for Recrystallization Purposes".
Journal of Applied Physics, vol. 55, No. 2, Jan. 15, 1984, pp. 519-523, D. R. Bradbury et al.: "Control of Lateral Epitaxial Chemical Vapor Deposition of Silicon Over Insulators".
Proceedings of the 4th Annual Esprit Conference, Sep. 1987, pp. 55-71, D. Chapuis et al.: "SOI Materials and Processing Towards 3D Integration".
Journal of Crystal Growth, vol. 73, 1985, pp. 73-76, Amsterdam, NL; K. Kamon et al.: "Selective Epitaxial Growth of GaAs by Low-Pressure MOVPE".

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