Coating processes – Electrical product produced – Welding electrode
Patent
1990-03-29
1991-12-03
Beck, Shrive P.
Coating processes
Electrical product produced
Welding electrode
4272481, 427255, 4272553, 4272552, 4272551, 118715, C23C 1600, B05D 306
Patent
active
050699300
ABSTRACT:
Monomers containing silicon and oxygen which are liquid at room temperature and have a low vapor pressure are fed in a liquid state via a mass flow regulator to an evaporator provided with a body having capillary action where the liquid is evaporated by radiant heat. Evaporated monomer is fed to the reaction zone of a vacuum chamber where thin coatings are applied on substrates by chemical vapor deposition.
REFERENCES:
patent: 4892753 (1990-01-01), Wang et al.
patent: 4959524 (1990-09-01), Rudnay
Chin and Van de Ven, "Plasma TEOS process for interlayer dielectric applications", Solid State Technology, Apr. 1988, pp. 119-122.
Mukherjee and Evans, "The Deposition of Thin Films by Decompositions of TEOS in a Radio Frequency Glow Discharge", Thin Solid Films, 14 (1972), pp. 105-118.
Mackens and Merkt, "Plasma Enhanced Vapor Deposited SiO.sub.2 for Metal/Oxide/Semiconductor Structures on InSb", Thin Solid Films, 97 (1982), pp. 53-61.
Howard, "Selecting Semiconductor Dopants for Precise Process Control", Microelectronic Manufacturing and Testing, Dec. 1985, pp. 20-24.
Hussla Ingo
Ritter Jochen
Beck Shrive P.
King Roy V.
Leybold Aktiengesellschaft
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