Method for the electrical insulation of a circuit function eleme

Details Method for the electrical insulation of a circuit function eleme Method for the electrical insulation of a circuit function eleme

1993-05-03

1994-09-13

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437231, 437948, 156646, 156649, 1566591, H01L 21465

Patent

active

053468627

ABSTRACT:
Method for the electrical insulation of a function element on a semiconductor component, wherein the function element is etched into a mesa (9) using a mask (8). A dielectric (10) is then applied surface-wide at least up to the height of the mesa (9). The more deeply disposed portions of this dielectric layer are covered with photoresist (11), and the photoresist (11) is caused to flow by tempering and, thus, is caused to level the surface. Finally, the photoresist (11) and the dielectric (10) are re-etched with the same etching rate until the mesa is uncovered.

REFERENCES:
patent: 4447290 (1984-05-01), Matthews
patent: 4676868 (1987-06-01), Riley et al.
patent: 4839311 (1989-06-01), Riley et al.
patent: 4939105 (1990-07-01), Langley
IEEE 1991 Bipolar Circuits and Technology Meeting Minneapolis, Minn.
Journal of Crystal Growth 107 (1991) pp. 883-892.
Electronics Letters vol. 25, No. 2 (1989) pp. 127-128.

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