Method for the directed modulation of the composition or doping

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148DIG26, 148DIG41, 437 89, 437 90, 437108, 437110, 437126, 437133, 437976, H01L 21205

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052945642

ABSTRACT:
The invention pertains to the field of fabrication, by vapor phase deposition, of the thin layers of monocrystalline, polycrystalline or amorphous material on a substrate having an identical or different nature. The aim is to provide a method, enabling this structure to be made, that includes a modulation of both the composition and the doping, in a direction that is not perpendicular to the surface of the substrate, notably in a lateral way to obtain a planar technology. According to the invention, this thin layer is made by conformal epitaxy, using a crystalline seed in gas phase, between two confinement layers made of a distinct material in such a way that there can be neither nucleation nor deposition of semiconductive material on the surfaces of said confinement layers and wherein the variation of the gaseous mixture of said gas phase is controlled to obtain said modulation of the composition and/or of the doping of said thin film.

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Gallium Arsenide and Related Compounds, 1986, (Proceedings of the Thirteenth International Symposium), pp. 1-8, H. Watanabe et al., "Atomic Layer Epitaxy".
Applied Physics Letters, vol. 51, Nov. 9, 1987, pp. 1518-1520, H. Asai et al., "Narrow Two-Dimensional Electron Gas Channels In GaAs/AlGaAs Sidewall Interfaces By Selective Growth".
Japanese Journal of Applied Physics, vol. 24, No. 12, Dec. 1985, pp. 1666-1671, K. Yamaguchi et al., "Selective Epitaxial Growth of GaAs By Metalorganic Chemical Vapor Deposition".

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