Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent
1976-10-14
1979-02-13
Smith, Ronald H.
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
96 1LY, 118109, 118119, 118661, 355 10, 427359, G03G 1310
Patent
active
041396537
ABSTRACT:
A process of producing a liquid image, wherein an insulating material bearing an electrostatic charge pattern detectable at its surface is developed by wetting with a developing liquid according to such charge pattern and wherein in said process developing liquid is brought substantially uniformly in close proximity to or in contact with said material by the use of at least one developing liquid applicator means followed by at least one other means that is capable of removing from the charge-carrying member some of the developing liquid already deposited by the or a said preceding applicator means.
REFERENCES:
patent: 2531036 (1950-11-01), Goettsch
patent: 2889758 (1959-06-01), Bolton
patent: 3084043 (1963-04-01), Gundlach
patent: 3262840 (1966-07-01), Hervey
patent: 3356066 (1967-12-01), Larsson et al.
patent: 3368526 (1968-02-01), Matsumoto et al.
patent: 3383209 (1968-05-01), Cassiers et al.
patent: 3389656 (1968-06-01), Giori
patent: 3468248 (1969-09-01), Giori
patent: 3815989 (1974-06-01), Davis et al.
patent: 3820891 (1974-06-01), Kurakawa et al.
patent: 3830199 (1974-08-01), Saito
patent: 3839071 (1974-10-01), Borelli
patent: 3923002 (1975-12-01), Vanyi
Cassiers Paul M.
Verlinden Willy G.
AGFA-GEVAERT N.V.
Daniel William J.
Frenkel Stuart D.
Smith Ronald H.
LandOfFree
Method for the development of electrostatic charge patterns does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the development of electrostatic charge patterns, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the development of electrostatic charge patterns will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-691756