Method for the development of electrostatic charge patterns

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined

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96 1LY, 118109, 118119, 118661, 355 10, 427359, G03G 1310

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active

041396537

ABSTRACT:
A process of producing a liquid image, wherein an insulating material bearing an electrostatic charge pattern detectable at its surface is developed by wetting with a developing liquid according to such charge pattern and wherein in said process developing liquid is brought substantially uniformly in close proximity to or in contact with said material by the use of at least one developing liquid applicator means followed by at least one other means that is capable of removing from the charge-carrying member some of the developing liquid already deposited by the or a said preceding applicator means.

REFERENCES:
patent: 2531036 (1950-11-01), Goettsch
patent: 2889758 (1959-06-01), Bolton
patent: 3084043 (1963-04-01), Gundlach
patent: 3262840 (1966-07-01), Hervey
patent: 3356066 (1967-12-01), Larsson et al.
patent: 3368526 (1968-02-01), Matsumoto et al.
patent: 3383209 (1968-05-01), Cassiers et al.
patent: 3389656 (1968-06-01), Giori
patent: 3468248 (1969-09-01), Giori
patent: 3815989 (1974-06-01), Davis et al.
patent: 3820891 (1974-06-01), Kurakawa et al.
patent: 3830199 (1974-08-01), Saito
patent: 3839071 (1974-10-01), Borelli
patent: 3923002 (1975-12-01), Vanyi

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