Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Organic component
Patent
1993-12-15
1995-05-30
Straub, Gary P.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Organic component
423240R, 588206, A62D 300
Patent
active
054198852
ABSTRACT:
A process for destructively scrubbing methyl chloride gas comprising contacting the gas with a scrubbing solution comprising ethanolamine is described.
REFERENCES:
Chem. Abstracts CA88(10):65463q.
Chem. Abstracts CA82(23):150543m.
Doran Henry
Keaveny Brian
Schering Corporation
Straub Gary P.
Thompson Paul A.
LandOfFree
Method for the destructive scrubbing of methyl chloride gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the destructive scrubbing of methyl chloride gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the destructive scrubbing of methyl chloride gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-359839