Coating processes – Direct application of electrical – magnetic – wave – or... – Chemical vapor deposition
Patent
1993-06-09
1994-11-29
Kunemund, Robert
Coating processes
Direct application of electrical, magnetic, wave, or...
Chemical vapor deposition
423446, 20415747, 427596, C30B 2904
Patent
active
053686810
ABSTRACT:
A method is disclosed for the deposition of crystalline diamond on a substrate such as a silicon wafer. A polymer (for example poly(methylmethacrylate)) is provided as a target for laser ablation using for example an ArF excimer laser or an Nd-Yag laser. The laser ablation is performed in the presence of a reactive gas such as oxygen or hydrogen. The substrate is heated to a temperature of between 450 and 700 degrees celsius.
REFERENCES:
patent: 4961958 (1990-10-01), Desphandey et al.
patent: 5055318 (1991-10-01), Deutchman et al.
patent: 5236545 (1993-08-01), Pryer
patent: 5242711 (1993-09-01), DeNatale et al.
Hiraoka Hiroyuki
Latsch Stefan A.
Xiao Rong-Fu
Hong Kong University of Science
Hong Kong University of Science and Technology
Kunemund Robert
R and D Corporation Limited
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