Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating
Patent
1997-02-21
1998-10-20
King, Roy V.
Coating processes
Coating by vapor, gas, or smoke
Carbon or carbide coating
427305, 427438, 427577, 427405, 427575, 427571, C23C 2800, C23C 1626, B05D 310
Patent
active
058243674
DESCRIPTION:
BRIEF SUMMARY
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates, in general, to a method for depositing diamond film and, more specifically, to a method for the deposition of diamond film on an electroless-plated nickel layer.
2. Description of the Prior Art
Diamond film is generally used for various purposes, such as protective coatings, engineering materials, electronic materials and the like, since it has the same superior physical properties as natural diamond.
Methods for producing a diamond coating are largely divided into chemical vapor deposition(hereinafter referred to as "CVD") and physical vapor deposition(hereinafter referred to as "PVD"). The CVD methods include microwave CVD, thermal filament CVD, high frequency CVD, electron cyclotron resonance microwave CVD, direct current plasma CVD, and so on, whereas the PVD methods include ion plating, ion beam sputtering, ion deposition, ion beam deposition and so on.
These diamond coating methods are different from conventional methods which employ high temperature and high pressure. In addition, objects with various shapes can be coated and the coated area can be enlarged thereby. Accordingly, diamond coating methods arouse worldwide interest in an economical aspect and application, and are being actively industrialized, especially among the advanced countries.
However, all materials can not be coated with diamond. Because diamond is non-metallic and non-mineral, the diamond film is not easily formed on such a substance as metal or ceramics. In addition, even if formed, the adhesion to a base layer is questionable.
A method is well known for forming a diamond coating on metal such as silicon or oxide materials such as alumina and silica. However, due to the poor adhesion as stated above, it is difficult to form a diamond coating on high speed tool steel, hard metal (M or P type), fine particle hard metal, or stainless steel, in practice.
Much effort have been made to solve the adhesion problem. For example, Japanese Patent Laid-Open Publication No. Heisei 3-232973 discloses that Al.sub.2 O.sub.3, TiN, ZrN and BN are coated on a diamond tip by a CVD or a PVD method to improve the adhesion to the diamond tip, and thereby increases the life of the tool. In Japanese Patent Laid-Open Publication No. Heisei 1-104970 and Korean Patent Laid-Open 92-801, a metal deposition process (vacuum evaporation, ion plating, MO CVD, or sputtering process) is performed with at least one metal selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Si, and the equivalents thereof on the surface of a super alloy of WC at least 80% by weight, and then a thin diamond film is deposited on the metal surface.
However, none of the prior arts employs the electroless plating method, which is superior in adhesion and capable of plating regardless of the types of material, in order to form a surface layer or an inter layer.
SUMMARY OF THE INVENTION
The present inventors have recognized that there is a need for a method for depositing a diamond film, superior in adhesion, and found out that a diamond coating on an electrolessly plated nickel layer is excellent in solving the above problem encountered in prior arts.
The object of the present invention is to provide a method for the deposition of a diamond film, superior in adhesion regardless of the material of a substrate to be plated.
The present invention for the deposition of diamond film comprises the successive steps of immersing metallic or nonmetallic material in an electroless nickel plating bath containing a reducing agent to form a nickel layer; and depositing the diamond film on the electrolessly plated material.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a scanning electron microscopic photograph magnified by five hundred times, showing a diamond film according to an Example 1 of the present invention.
FIG. 2 is a scanning electron microscopic photograph magnified by five hundred times, showing a diamond film according to an Example 2 of the present invention.
DETAILED DESCRIP
REFERENCES:
patent: 4906532 (1990-03-01), Spencer, Jr.
patent: 5487945 (1996-01-01), Yang et al.
The Journal of the Surface finishing Society of Japan, Diamond Synthesis on Fe-P, Ni-P, Plated Substrate, 1996, pp. 44-48 with English language abstract.
Park Jung-Il
Park Kwang-Ja
King Roy V.
National Institute of Technology and Quality
LandOfFree
Method for the deposition of diamond film on an electroless-plat does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the deposition of diamond film on an electroless-plat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the deposition of diamond film on an electroless-plat will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-242145